发明名称 METHOD FOR MANUFACTURING LIQUID DROPLET DISCHARGE HEAD AND METHOD FOR MANUFACTURING LIQUID DROPLET DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid droplet discharge head in which it is possible to form a diaphragm which has reduced the variation in thickness or plane accuracy without changing a mounting step depending on a diaphragm material, and to provide a method for manufacturing a liquid droplet discharge apparatus. SOLUTION: The method comprises the steps of: forming an etching stop film 61 on one surface of a silicon substrate 60 used as a cavity substrate 20; etching the silicon substrate 60 from the other surface side to the etching stop film 61 to form a concave portion used as a discharge room 21; forming a film of a conductive material used as a diaphragm 22 from the other surface side on at least the bottom of the concave portion; removing the etching stop film 61; and forming an insulating layer 23 on one surface of the silicon substrate 60 after removing the etching stop film 61. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009078515(A) 申请公布日期 2009.04.16
申请号 JP20070251337 申请日期 2007.09.27
申请人 SEIKO EPSON CORP 发明人 SAKASHITA YUKI;YAMAZAKI SEIJI
分类号 B41J2/045;B41J2/055;B41J2/16 主分类号 B41J2/045
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