发明名称 |
METHOD FOR MANUFACTURING LIQUID DROPLET DISCHARGE HEAD AND METHOD FOR MANUFACTURING LIQUID DROPLET DISCHARGE APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid droplet discharge head in which it is possible to form a diaphragm which has reduced the variation in thickness or plane accuracy without changing a mounting step depending on a diaphragm material, and to provide a method for manufacturing a liquid droplet discharge apparatus. SOLUTION: The method comprises the steps of: forming an etching stop film 61 on one surface of a silicon substrate 60 used as a cavity substrate 20; etching the silicon substrate 60 from the other surface side to the etching stop film 61 to form a concave portion used as a discharge room 21; forming a film of a conductive material used as a diaphragm 22 from the other surface side on at least the bottom of the concave portion; removing the etching stop film 61; and forming an insulating layer 23 on one surface of the silicon substrate 60 after removing the etching stop film 61. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009078515(A) |
申请公布日期 |
2009.04.16 |
申请号 |
JP20070251337 |
申请日期 |
2007.09.27 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SAKASHITA YUKI;YAMAZAKI SEIJI |
分类号 |
B41J2/045;B41J2/055;B41J2/16 |
主分类号 |
B41J2/045 |
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