发明名称 METHOD OF MEASURING OVERLAY ERROR, INSPECTION APPARATUS, AND LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an alternative method of calculating an overlay error which reduces the effect of noise and results in a more accurate overlay error calculation. <P>SOLUTION: The reflected radiation from a target mark including a plurality of diffraction gratings or the like is detected by an array of pixels. The overlay error of the gratings for each pixel is detected, and an array of overlay errors is determined. Rather than simply averaging the overlay error value for all the pixels, filtering is performed. Pixels may be filtered according to the detected value of the overlay error or the detected intensity of the pixel. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009081436(A) 申请公布日期 2009.04.16
申请号 JP20080232752 申请日期 2008.09.11
申请人 ASML NETHERLANDS BV 发明人 TENNER MANFRED GAWEIN;SCHAAR MAURITS VAN DER
分类号 H01L21/027;G01B11/00;G03F9/00 主分类号 H01L21/027
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