| 摘要 |
PROBLEM TO BE SOLVED: To provide an aluminum foil material for vapor deposition capable of securing high adhesiveness between a base and a vapor-deposited layer. SOLUTION: Disclosed is the aluminum foil material for vapor deposition which is 10 to 50μm thickness, the aluminum foil material for vapor deposition being characterized in 0.1μm≤Ra and Rsm≤18.0μm, where Ra is surface roughness measured in a direction perpendicular to the rolling direction of the foil material and RSm is an average peak interval. COPYRIGHT: (C)2009,JPO&INPIT
|
