发明名称 |
INSULATING FILM MANUFACTURING METHOD AND INSULATING FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide an insulating film manufacturing method which can manufacture an insulating film that is excellent in hardenability and has a low dielectric constant; and to provide an insulating film obtained by the manufacturing method. SOLUTION: The insulating film manufacturing method includes a process to coat a film forming composition and a process to irradiate ultraviolet rays to the coated film forming composition. The film forming composition contains a radical polymerization initiator a compound shown in a formula (1) and/or a polymer polymerized using at least the compound. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009081332(A) |
申请公布日期 |
2009.04.16 |
申请号 |
JP20070250525 |
申请日期 |
2007.09.27 |
申请人 |
FUJIFILM CORP |
发明人 |
MURAMATSU MAKOTO;HIRAOKA HIDETOSHI |
分类号 |
H01L21/312;H01L21/768;H01L23/522 |
主分类号 |
H01L21/312 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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