发明名称 CLEAN BENCH
摘要 PROBLEM TO BE SOLVED: To provide a clean bench used to clean polycrystalline silicon while sorting the polycrystalline silicon according to size or quality, which is used as a raw material to be melted in producing single crystal silicon, and to provide a method of producing a raw material for the single crystal silicon including a process for cleaning the silicon. SOLUTION: The clean bench comprises: a work table 2 on which the polycrystalline silicon is placed; a box 4 which includes side plates 8a, 8b to surround three sides except the front face of a space above the work table 2, and a ceiling plate which covers the upper side of the side plates 8a, 8b; supplying holes 16a supplying clean air onto the upper surface of the work table 2; suction holes 10a, 10b sucking air near the upper face of the work table 2; and an ionizer 20 ionizing the clean air to be blown onto the upper face of the work table and removing static electricity on the work table 2. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009078961(A) 申请公布日期 2009.04.16
申请号 JP20080168497 申请日期 2008.06.27
申请人 MITSUBISHI MATERIALS CORP 发明人 SAKAI KAZUHIRO;MIYATA YUKIKAZU
分类号 C30B29/06;C01B33/03 主分类号 C30B29/06
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