VERTICAL WAFER BOAT

摘要

Provided is a vertical wafer boat having improved purification efficiency in purifying process and a wafer supporting section increased in length. A top panel (7) is provided with an opening section (7a) formed by having, at the center, the center point of a wafer (W) to be placed; and a slit section (7b) formed on an insertion side of the wafer to reach the opening section (7). The width (T) of the slit (7) is 35% or more but not more than 45% of the width (fD) of the top plate (7). Upper surface angle sections (2a1, 3a1, 4a1, 5a1) are chamfered for 40% or more but not more than 60% of the lengths of wafer supporting sections (2a, 3a, 4a, 5a), from the leading end sections of the wafer supporting sections (2a, 3a, 4a, 5a) to column sections (2b, 3b, 4b, 5b). Upper surface angle sections (2a2, 3a2, 4a2, 5a2) from the chamfer end position to the column sections (2b, 3b, 4b, 5b) are formed at an angle of 90° or less.