FILM FORMATION APPARATUS AND METHODS INCLUDING TEMPERATURE AND EMISSIVITY/PATTERN COMPENSATION

摘要

A film formation system (10) has a processing chamber (15) bounded by sidewalk (18) and a top cover (11). In one embodiment, the top cover (11) has a reflective surface (13) for reflecting radiant energy back onto a substrate (19), pyrometers (405) for measuring the temperature of the substrate (19) across a number of zones, and at least one emissometer (410) for measuring the actual emissivity of the substrate ( 19). In another embodiment, a radiant heating system (313) is disposed under the substrate support ( 16). The temperature of the substrate (19) is obtained from pyrometric data from the pyrometers (405), and the emissometer (410).