发明名称 INSPECTION METHOD OF TFT ARRAY, AND INSPECTION DEVICE OF TFT ARRAY
摘要 PROBLEM TO BE SOLVED: To classify discriminably a true device defect caused by a short-circuit defect, a disconnection or the like from a pseudo defect caused by contamination, particles or the like. SOLUTION: The first defect detection for detecting the first true device defect, and the second defect detection for detecting the second true device defect and a pseudo defect together are performed by using inspection signals having each different signal pattern. In the first defect detection, since detection is performed in the unseparated state between a pseudo defect and a normal state, the pseudo defect is detected by pseudo defect detection. In the second defect detection, since detection is performed in the unseparated state between the second true device defect and a pseudo defect, the second true device defect is detected separately by using a pseudo defect detected by the pseudo defect detection. Hereby, a true device defect caused by a short-circuit defect, a disconnection or the like can be classified discriminably from a pseudo defect caused by contamination, particles or the like. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009079922(A) 申请公布日期 2009.04.16
申请号 JP20070247545 申请日期 2007.09.25
申请人 SHIMADZU CORP 发明人 NAKATANI ATSUO
分类号 G01R31/00;G02F1/13;G02F1/1368;G09F9/00 主分类号 G01R31/00
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