发明名称 Methods and Systems for Process Compensation Technique Acceleration
摘要 Selected cells in a semiconductor chip layout are replaced with corresponding PCT pre-processed cells. Each PCT pre-processed cell represents a particular selected cell having been previously subjected to a cell-level-PCT-processing operation so as to include PCT-based cell layout adjustments. Following replacement of the selected cells in the semiconductor chip layout with corresponding PCT pre-processed cells, a chip-wide PCT processing operation is performed on the semiconductor chip layout for a given chip level. The presence of the PCT pre-processed cells in the semiconductor chip layout serves to accelerate the chip-wide PCT processing of the semiconductor chip layout. The chip-wide PCT processed semiconductor layout for the given chip level is recorded on a persistent storage medium.
申请公布号 US2009100396(A1) 申请公布日期 2009.04.16
申请号 US20080340406 申请日期 2008.12.19
申请人 发明人 SMAYLING MICHAEL C.;MCAWEENEY MICHAEL A.;BECKER SCOTT T.
分类号 G06F17/50 主分类号 G06F17/50
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