| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photocurable coating composition having excellent surface smoothness, an overprint having excellent non-tackiness properties and surface smoothness, and a manufacturing method of the overprint produced by applying and curing the photocurable coating composition. <P>SOLUTION: The photocurable coating composition contains an ethylenic unsaturated compound having a cyclic amide group and/or a cyclic imide group, and a photopolymerization initiator. The photocurable coating composition has substantially no absorption in a visible range preferably and can be suitably used for an overprint of an electrophotographic printed matter. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
