| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which improves the collapsing properties of a resist pattern, substantially avoids profile deterioration, even at immersion exposure, inhibits elution of an acid into an immersion liquid in immersion exposure, has proper conformability with the immersion liquid, and is suitable for immersion exposure, and to provide a pattern forming method that uses the same. <P>SOLUTION: The resist composition comprises (A) resin, of which the solubility in an alkali developer increases by the action of an acid, (B) a compound which generates acid upon irradiation with actinic rays or radiation, (C) a hydrophobic resin obtained by anionic polymerization, and (D) a solvent. The pattern forming method that uses the same is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
