| 摘要 |
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D1) having a molecular weight of 200 or more, which is represented by general formula (d1) shown below (wherein each of R1 to R3 independently represents a hydrocarbon group which may have a substituent, with the proviso that at least one of R1 to R3 is a polar group-containing hydrocarbon group, at least one of R1 to R3 is a hydrophobic group, and two of R1 to R3 may be bonded to each other to form a ring with the nitrogen atom).
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