<p>Provided are a film forming method and a film forming apparatus for forming a film at low cost. The film forming method includes (i) a step of melting a solid-state thin film material (51) into a melt, forming a bar-like body (51b) by solidifying the melt (51a) and pulling out the bar-like body (51b), (ii) a step of melting a part of the bar-like body (51b) to supply to a melt (vapor source) (51d), and (iii) a step of forming a thin film by using the melt (vapor source) (51d). The steps (i), (ii) and (iii) are performed in vacuum.</p>
