发明名称 HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD AND STORAGE MEDIUM
摘要 <p>A heat treatment apparatus is provided to generate negative pressure in the lateral of the outer end part of a hot plate by conducting a gas from the gas discharge hole according to a peripheral direction of the hot plate. A heating unit(61) is composed of a support ring(80), a bottom plate(81), a rectifying plate(82), a tubular member, and a face plate(84). The face plate is formed with metal which is easily processed such as aluminium, stainless, and copper alloy. A second gas exhaust port(85) is formed in the central part of the support ring, and a standing wall(86) is formed through the peripheral direction of the support ring. A supporting shaft(87) is installed at the floor side of the support ring, and the support ring is supported by the supporting shaft on a floor(7). The bottom plate is supported by the supporting shaft of the support ring, and a third gas exhaust port(89) is formed in the central part of the bottom plate. The rectifying plate is installed at the upside of the supporting member(91), and a fourth gas exhaust port(93) is formed in the central part of the rectifying plate.</p>
申请公布号 KR20090037808(A) 申请公布日期 2009.04.16
申请号 KR20080097044 申请日期 2008.10.02
申请人 TOKYO ELECTRON LIMITED 发明人 SAKAI YUICHI;YAMAGUCHI KIYOMITSU
分类号 H01L21/324;H01L21/027 主分类号 H01L21/324
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