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发明名称
曝光设备,用以选择光学元件之方法,及装置制造方法
摘要
一种曝光设备包括用于产生具有250 nm或更短之波长之光的光源,包含具有合成石英做为透镜材料之光学元件并用于使用该光源产生之光照亮原板的照明光学系统,及用于将该原板之图样投影至基板上的投影光学系统。具有红外线吸收带3585 cm#sP!-1#eP!之该光学元件之羟基的吸收系数之值系落入依据该光源产生之光的波长而决定之范围内。
申请公布号
TW200916973
申请公布日期
2009.04.16
申请号
TW097125106
申请日期
2008.07.03
申请人
佳能股份有限公司
发明人
川上智朗
分类号
G03F7/20(2006.01)
主分类号
G03F7/20(2006.01)
代理机构
代理人
林志刚
主权项
地址
日本
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