发明名称 WAFER PRESENCE DETECTION
摘要 The presence of a workpiece on an end effector of a vacuum robotic handler is detecting using any of a number of non-contact techniques in which some or all of the detection hardware is positioned outside a vacuum chamber that encloses the vacuum robotic handler. Various deployments include laser beam breaking, analysis of radar reflection signals, or analysis of radio frequency identification tag signatures. By providing non-physical couplings between hardware inside and outside of a vacuum environment, integrity of the vacuum is improved. These non-contact techniques are further adapted as described herein to multi-wafer and multi-end effector environments so that independent detection of multiple wafers (e.g., for each end effector) can be performed.
申请公布号 US2009095886(A1) 申请公布日期 2009.04.16
申请号 US20080195095 申请日期 2008.08.20
申请人 VAN DER MEULEN PETER;FOGEL PAUL E 发明人 VAN DER MEULEN PETER;FOGEL PAUL E.
分类号 H01J40/14;B25J15/06 主分类号 H01J40/14
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