发明名称 BUFFER LAYER FOR FRONT ELECTRODE STRUCTURE IN PHOTOVOLTAIC DEVICE OR THE LIKE
摘要 Certain example embodiments of this invention relate to an electrode structure (e.g., front electrode structure) for use in a photovoltaic device or the like. In certain example embodiments, a buffer layer (e.g., of or including tin oxide) is provided between the front electrode and the semiconductor absorber film in a photovoltaic device. The buffer layer may be deposited via sputtering, and may or may not be doped in certain example instances. In an example context of use in CdS/CdTe photovoltaic devices, the buffer layer is advantageous in that it (one or more of): (a) provides a good work-function match to a possible CdS/CdTe film and the front electrode; (b) provides good durability in that it is better able to withstand attacks of sulfur vapors at elevated temperatures during possible CdS/CdTe processing; (c) may be at least partially conductive; and/or (d) provides good mechanical durability.
申请公布号 WO2008112056(A3) 申请公布日期 2009.04.16
申请号 WO2008US01875 申请日期 2008.02.13
申请人 GUARDIAN INDUSTRIES CORP.;KRASNOV, ALEXEY;LU, YIWEI 发明人 KRASNOV, ALEXEY;LU, YIWEI
分类号 H01L31/0224;H01L31/0392;H01L31/18 主分类号 H01L31/0224
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