EUV RADIATION SOURCE

摘要

A radiation source comprising a chamber (1) and a supply of a plasma generating substance, the source having an interaction point (13) at which the plasma generating substance introduced into the chamber may interact with a laser beam (7) and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit (11) arranged to deliver a buffer gas into the chamber, the conduit having an outlet (12) which is adjacent to the interaction point.