发明名称 Method for fabricating semiconductor light emitting element, semiconductor light emitting element, method for fabricating semiconductor element, semiconductor element, method for fabricating element and element
摘要 When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III-V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III-V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III-V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions. <IMAGE>
申请公布号 KR100893232(B1) 申请公布日期 2009.04.16
申请号 KR20077021454 申请日期 2007.09.18
申请人 发明人
分类号 C30B25/02;H01L21/20;H01L33/00;H01L33/02;H01L33/16;H01L33/32;H01S5/02;H01S5/20;H01S5/22;H01S5/223;H01S5/323;H01S5/40 主分类号 C30B25/02
代理机构 代理人
主权项
地址