发明名称 Servo control system, lithographic apparatus and control method.
摘要 A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.
申请公布号 NL1036028(A1) 申请公布日期 2009.04.15
申请号 NL20081036028 申请日期 2008.10.07
申请人 ASML NETHERLANDS B.V. 发明人 YOUSSEF KAREL MARIA DE VOS;DIRK-JAN BIJVOET;RONALD CASPER KUNST;RAMIDIN IZAIR KAMIDI;KHALID MANSSOURI
分类号 G03F9/00;G03F7/20 主分类号 G03F9/00
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