| 摘要 |
<p>In an optical characteristic measuring method for measuring an optical characteristic of a projection optical system (10a), a reticle (9) having a plurality of patterns (TP) is supplied, and scattered light from an aperture is directed to said plurality of patterns (TP), whereby light beams are projected onto said plurality of patterns in mutually different directions, by which images of said plurality of patterns are formed through said projection optical system (10a). Positions of images of said plurality of patterns, respectively, are detected and, by use of the result of detection, the optical characteristic of said projection optical system is detected. This accomplishes an optical characteristic measuring method and a reticle to be used therefor, which are suitable for measuring an optical characteristic of an optical system such as wavefront aberration, for example, at high precision. <IMAGE></p> |
