METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE CONDUCTIVE LAYER SURFACE,申请号EP20040819950-传众专利搜索

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发明名称	METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE CONDUCTIVE LAYER SURFACE
摘要
申请公布号	EP1691403(A4)	申请公布日期	2009.04.15
申请号	EP20040819950	申请日期	2004.12.03
申请人	TOKYO ELECTRON LIMITED	发明人	SASAKI, MASARU;IDE, SHINJI;OZAKI, SHIGENORI
分类号	H01L21/02;H01L21/306;H01L21/311;H01L21/768	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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