发明名称 P-TYPE ZINC OXIDE THIN FILM AND METHOD FOR FORMING THE SAME
摘要 This invention provides a p-type zinc oxide thin film, which can be clearly proven to be a p-type semiconductor based on the magnetic field dependence of hole voltage by hole effect measurement by hole bar, a method for manufacturing the thin film with good reproduction, and a light emitting element using the thin film. Regarding the preparation of a p-type zinc oxide semiconductor thin film, in order to develop p-type semiconductor properties of zinc oxide, a method for converting zinc oxide to p-type is proposed. The method is characterized by combining the step of annealing a p-type dopant added to a thin film at an elevated temperature to activate the p-type dopant, or applying an active species of a p-type dopant during film formation to dope the p-type dopant in an activated state, with the step of conducting annealing at a low temperature in an oxidizing atmosphere. There are also provided a p-type zinc oxide thin film and a light emitting element realized by the above method. The above constitution can realize the preparation of highly reliable p-type zinc oxide thin film, preparation method thereof, and blue light emitting element using the thin film.
申请公布号 KR20090037400(A) 申请公布日期 2009.04.15
申请号 KR20087031056 申请日期 2007.07.06
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 KUSUMORI TAKESHI;HORI TAKAHIRO
分类号 H01L21/20;C23C16/40;C30B23/02;H01L33/28 主分类号 H01L21/20
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