| 摘要 |
A monolithic thin film variable power divider is disclosed for variable power level distribution. The thin film power divider includes a substrate having a main surface, a first stage and a second stage, each formed as thin film networks on the main surface of the substrate. The first stage includes a plurality of transmission lines, at least one of the transmission lines having a variable dielectric deposition layer providing variable power level distribution. The variable dielectric deposition is a paraelectric, such as Barium-Strontium-Titanate. The second stage includes a hybrid combiner. The thin film power divider is capable of operating at frequencies extending into the millimeter wave spectrum. The thin film power divider provides a cost effective device that varies the balance of power through a multiport RF distribution network while simultaneously maintaining little, or low, frequency dispersion during the dynamic dissemination process.
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