发明名称 |
Stressed thin-film membrane islands |
摘要 |
A structure including a support defining an opening, and a tensilely stressed thin-film membrane disposed to occlude the opening, the membrane contacting at least a portion of the support. The stressed membrane includes a material having a characteristic crack spacing greater than one-half of a minimum dimension of the membrane and less than ten times the minimum dimension. A structure including a support defining a opening having a minimum opening dimension, and a compressively stressed thin-film membrane disposed to occlude the opening, the membrane contacting at least a portion of the support. The stressed membrane includes a membrane material having a critical aspect ratio for buckling that is greater than a ratio of one-half of the minimum opening dimension to a thickness of the membrane, and the critical aspect ratio for buckling is less than a ratio of ten times the minimum opening dimension to the thickness of the membrane.
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申请公布号 |
US7517603(B2) |
申请公布日期 |
2009.04.14 |
申请号 |
US20040948084 |
申请日期 |
2004.09.23 |
申请人 |
LILLIPUTIAN SYSTEMS, INC. |
发明人 |
SCHAEVITZ SAMUEL B.;FRANZ ALEKSANDER;BARTON ROGER W. |
分类号 |
H01M8/10;B01D39/00;B01D67/00;B01D69/02;B01D69/10;B01D71/02;C01B3/50;H01M8/00;H01M8/12;H01M8/24 |
主分类号 |
H01M8/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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