发明名称 Stressed thin-film membrane islands
摘要 A structure including a support defining an opening, and a tensilely stressed thin-film membrane disposed to occlude the opening, the membrane contacting at least a portion of the support. The stressed membrane includes a material having a characteristic crack spacing greater than one-half of a minimum dimension of the membrane and less than ten times the minimum dimension. A structure including a support defining a opening having a minimum opening dimension, and a compressively stressed thin-film membrane disposed to occlude the opening, the membrane contacting at least a portion of the support. The stressed membrane includes a membrane material having a critical aspect ratio for buckling that is greater than a ratio of one-half of the minimum opening dimension to a thickness of the membrane, and the critical aspect ratio for buckling is less than a ratio of ten times the minimum opening dimension to the thickness of the membrane.
申请公布号 US7517603(B2) 申请公布日期 2009.04.14
申请号 US20040948084 申请日期 2004.09.23
申请人 LILLIPUTIAN SYSTEMS, INC. 发明人 SCHAEVITZ SAMUEL B.;FRANZ ALEKSANDER;BARTON ROGER W.
分类号 H01M8/10;B01D39/00;B01D67/00;B01D69/02;B01D69/10;B01D71/02;C01B3/50;H01M8/00;H01M8/12;H01M8/24 主分类号 H01M8/10
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