发明名称 |
Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) table |
摘要 |
A method of monitoring a processing system in real-time using low-pressure based modeling techniques that include processing one or more of wafers in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.
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申请公布号 |
US7519885(B2) |
申请公布日期 |
2009.04.14 |
申请号 |
US20060278382 |
申请日期 |
2006.03.31 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KAUSHAL SANJEEV;PANDEY PRADEEP;SUGISHIMA KENJI |
分类号 |
G06F11/00;G01R31/26;G06F11/30;G06F19/00;G11C29/00 |
主分类号 |
G06F11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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