发明名称 |
Thin-film semiconductor substrate, method of manufacturing thin-film semiconductor substrate, method of crystallization, apparatus for crystallization, thin-film semiconductor device, and method of manufacturing thin-film semiconductor device |
摘要 |
A thin-film semiconductor substrate includes an insulative substrate, an amorphous semiconductor thin film that is formed on the insulative substrate, and a plurality of alignment marks that are located on the semiconductor thin film and are indicative of reference positions for crystallization.
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申请公布号 |
US7518252(B2) |
申请公布日期 |
2009.04.14 |
申请号 |
US20060509605 |
申请日期 |
2006.08.25 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD |
发明人 |
HIRAMATSU MASATO;KIMURA YOSHINOBU;OGAWA HIROYUKI;JYUMONJI MASAYUKI;MATSUMURA MASAKIYO |
分类号 |
H01L23/28;H01L29/786;H01L23/544;H01L29/04 |
主分类号 |
H01L23/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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