发明名称 Thin-film semiconductor substrate, method of manufacturing thin-film semiconductor substrate, method of crystallization, apparatus for crystallization, thin-film semiconductor device, and method of manufacturing thin-film semiconductor device
摘要 A thin-film semiconductor substrate includes an insulative substrate, an amorphous semiconductor thin film that is formed on the insulative substrate, and a plurality of alignment marks that are located on the semiconductor thin film and are indicative of reference positions for crystallization.
申请公布号 US7518252(B2) 申请公布日期 2009.04.14
申请号 US20060509605 申请日期 2006.08.25
申请人 ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD 发明人 HIRAMATSU MASATO;KIMURA YOSHINOBU;OGAWA HIROYUKI;JYUMONJI MASAYUKI;MATSUMURA MASAKIYO
分类号 H01L23/28;H01L29/786;H01L23/544;H01L29/04 主分类号 H01L23/28
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