| 摘要 |
FIELD: chemistry. ^ SUBSTANCE: present invention refers to new surface-active polysolioxane photoinitiators. There are disclosed polymer photoinitiator of formula I, method of production by reaction of methyl ether of phenylglyoxal acid and silicon compound with end group OH- of formula I'. Additionally, there are disclosed photocurable composition containing (A) at least one ethylene-unsaturated free radical photopolymerised compound; and (B) at least one surface-active photoinitiator of formula I specified above; (C) thermally cross-linked compounds optionally; (D) other additives optionally; (C) other photoinitiators optionally. Besides, there is disclosed method for making coatings with scratch-resistant and/or chemically resistant surfaces wherein which photocurable composition specified above covers a substrate. There is also described application of componds of formula I as surface-active photoinitiators for photopolymerising ethylene-unsaturated compounds or mixtures. There is described coated substrate, containing at least on one surface covered with photocurable composition specified above. ^ EFFECT: making certain siloxane compound ensuring improved full curing and scratch resistance of coatings. ^ 7 cl, 2 tbl, 5 ex |
