ETCH METHODS TO FORM ANISOTROPIC FEATURES FOR HIGH ASPECT RATIO APPLICATIONS,申请号KR20070017755-传众专利搜索

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发明名称	ETCH METHODS TO FORM ANISOTROPIC FEATURES FOR HIGH ASPECT RATIO APPLICATIONS
摘要
申请公布号	KR100892797(B1)	申请公布日期	2009.04.10
申请号	KR20070017755	申请日期	2007.02.22
申请人		发明人
分类号	H01L21/3065	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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