发明名称 METHOD OF MANUFACTURING OF THICK-FILM STRUCTURE ON BASIS OF HIGH-TEMPERATURE SUPERCONDUCTOR
摘要 FIELD: physics. ^ SUBSTANCE: method of manufacturing of thick-film structure on the basis of high-temperature superconductor includes application of intermediate layer on substrate and thick film of high-temperature superconductor of a bismuthic system (Bi,Pb)-Sr-Ca-Cu-O. As the intermediate layer, the layer coinciding on composition with thick film of high-temperature superconductor, transited stages of prestress drying and heat treatment is used at temperature 886C before its full fusion. ^ EFFECT: improvement of qualitative performances of thick-film HTSC structures and curing time reduction of basic HTSC layer which leads to formation of its superconducting properties, by introduction in structure of intermediate stratum of the same composition at maintenance of adhesion of the intermediate stratum to substrate and the basic stratum to the intermediate. ^ 1 dwg
申请公布号 RU2352025(C1) 申请公布日期 2009.04.10
申请号 RU20070129115 申请日期 2007.07.31
申请人 GOSUDARSTVENNOE OBRAZOVATEL'NOE UCHREZHDENIE VYSSHEGO PROFESSIONAL'NOGO OBRAZOVANIJA MOSKOVSKIJ GOSUDARSTVENNYJ INSTITUT EHLEKTRONNOJ TEKHNIKI (TEKHNICHESKIJ UNIVERSITET) 发明人 VOLIK NINA NIKOLAEVNA;GRIGORASHVILI JURIJ EVGEN'EVICH
分类号 H01L39/24 主分类号 H01L39/24
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