发明名称 |
HIGH PERFORMANCE SILICONDIODE WITH IMPROVED THERMAL STABILITY |
摘要 |
FIELD: electrics; physics. ^ SUBSTANCE: high performance silicon diode with improved thermal stability includes sequence of emitter layer of first conductivity type, low-reinforced base layer of second conductivity type and high-reinforced layer of second conductivity type with specific resistance lower than that of base layer. Additionally high-reinforced layer of second conductivity type includes area with reinforcement additive concentration lower than in adjoining areas of the layer. Maximum concentration of reinforcement additive in the part of high-reinforcement layer of second conductivity type between additional area and low-reinforcement base layer of second conductivity type is 51018 [cm-3] or higher, and concentration of reinforcement additive within additional area is 21015(Jmax/Jmax 0)[cm-3] or higher, where Jmax [A/cm2] is maximum impulse density of direct current in diode, and Jmax 0 [A/cm2]=1000. ^ EFFECT: positive temperature property of direct voltage through the whole direct current density range. ^ 3 dwg
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申请公布号 |
RU2352022(C1) |
申请公布日期 |
2009.04.10 |
申请号 |
RU20070135816 |
申请日期 |
2007.09.27 |
申请人 |
FEDERAL'NOE GOSUDARSTVENNOE UNITARNOE PREDPRIJATIE "VSEROSSIJSKIJ EHLEKTROTEKHNICHESKIJ INSTITUT IM. V.I. LENINA" |
发明人 |
SURMA ALEKSEJ MARATOVICH;MNATSAKANOV TIGRAN TIGRANOVICH;STORCHAK NIKOLAJ SERGEEVICH;FREJDLIN ANDREJ SERGEEVICH;PRIKHOD'KO ANNA IVANOVNA |
分类号 |
H01L29/861 |
主分类号 |
H01L29/861 |
代理机构 |
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代理人 |
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地址 |
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