发明名称 HIGH PERFORMANCE SILICONDIODE WITH IMPROVED THERMAL STABILITY
摘要 FIELD: electrics; physics. ^ SUBSTANCE: high performance silicon diode with improved thermal stability includes sequence of emitter layer of first conductivity type, low-reinforced base layer of second conductivity type and high-reinforced layer of second conductivity type with specific resistance lower than that of base layer. Additionally high-reinforced layer of second conductivity type includes area with reinforcement additive concentration lower than in adjoining areas of the layer. Maximum concentration of reinforcement additive in the part of high-reinforcement layer of second conductivity type between additional area and low-reinforcement base layer of second conductivity type is 51018 [cm-3] or higher, and concentration of reinforcement additive within additional area is 21015(Jmax/Jmax 0)[cm-3] or higher, where Jmax [A/cm2] is maximum impulse density of direct current in diode, and Jmax 0 [A/cm2]=1000. ^ EFFECT: positive temperature property of direct voltage through the whole direct current density range. ^ 3 dwg
申请公布号 RU2352022(C1) 申请公布日期 2009.04.10
申请号 RU20070135816 申请日期 2007.09.27
申请人 FEDERAL'NOE GOSUDARSTVENNOE UNITARNOE PREDPRIJATIE "VSEROSSIJSKIJ EHLEKTROTEKHNICHESKIJ INSTITUT IM. V.I. LENINA" 发明人 SURMA ALEKSEJ MARATOVICH;MNATSAKANOV TIGRAN TIGRANOVICH;STORCHAK NIKOLAJ SERGEEVICH;FREJDLIN ANDREJ SERGEEVICH;PRIKHOD'KO ANNA IVANOVNA
分类号 H01L29/861 主分类号 H01L29/861
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