| 发明名称 |
METHOD OF SILICON PLATE SURFACE PROCESSING |
| 摘要 |
FIELD: electrics. ^ SUBSTANCE: method of silicon plate surface processing involves plate loading into bath filled by isopropyl alcohol and dirt cleaning at 255 Hz ultrasound frequency for 51 minutes. Control is performed under focused light by the number of luminescent points. Number of luminescent points should be below 5. ^ EFFECT: complete removal of dirt, prevention of silicon plate damage, chipping and fracture.
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| 申请公布号 |
RU2352021(C1) |
申请公布日期 |
2009.04.10 |
| 申请号 |
RU20070127110 |
申请日期 |
2007.07.16 |
| 申请人 |
GOSUDARSTVENNOE OBRAZOVATEL'NOE UCHREZHDENIE VYSSHEGO PROFESSIONAL'NOGO OBRAZOVANIJA "DAGESTANSKIJ GOSUDARSTVENNYJ TEKHNICHESKIJ UNIVERSITET" (DGTU) |
发明人 |
ISMAILOV TAGIR ABDURASHIDOVICH;SHAKHMAEVA AJSHAT RASULOVNA;SHANGEREEVA BIJKE ALIEVNA |
| 分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
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