发明名称 PATTERN FORMING METHOD AND METHOD FOR FORMING MULTILAYER WIRING STRUCTURE
摘要 One embodiment of the present invention is a pattern forming method including: (I) a graft polymer forming step of preparing a substrate whose surface is modified with a graft polymer directly chemically bonded to a base material; (II) a particle-dispersed liquid placing step of placing droplets including a dispersion liquid including a liquid (dispersion medium) and particles dispersed therein on the graft polymer-formed surface in a predetermined pattern by a droplet discharging method; and (III) a particle pattern forming step of evaporating the liquid (dispersion medium) from the droplets placed, to form a layer including particles on the substrate in a predetermined pattern.
申请公布号 US2009090463(A1) 申请公布日期 2009.04.09
申请号 US20060915071 申请日期 2006.05.19
申请人 FUJIFILM CORPORATION 发明人 KAWAMURA KOICHI
分类号 B32B38/04;B05D5/12 主分类号 B32B38/04
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