| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for forming an antireflection film, restraining the occurrence of phase separation and holding down the occurrence of repellency in coating to the minimum, to reduce the cost, to provide an antireflection film having excellent scratch resistance, stain resistance and chemical resistance and having low reflectance, and to provide an antireflection film, restraining clutch sound generated due to rubbing of a bezel and the end of the antireflection film in assembling an image display device. <P>SOLUTION: This composition for forming the antireflection film includes: a multi-functional photosensitive monomer; a photosensitive monomer having an unsaturated double bond and a branch carbon chain; a photo-polymerization initiator; and an organic solvent. <P>COPYRIGHT: (C)2009,JPO&INPIT |
