| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film production method and a thin film production system where the defects of a thin film caused by the generation of nodules can be reduced. SOLUTION: In the thin film production method where sputtering is performed while swinging a magnet arranged at the lower part of a target, the change of the swinging range of stepwise narrowing the swinging range of the magnet is performed, so that the defects of a thin film caused by the generation of nodules is reduced. In the thin film production system where sputtering is performed while swinging a magnet arranged at the lower part of a target, a changing means capable of changing the swinging range of the magnet is provided. COPYRIGHT: (C)2009,JPO&INPIT
|
