发明名称 PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma reactor improving plasma uniformity. <P>SOLUTION: An RF ground return current flow is diverted away from asymmetrical features of a reactor chamber by providing bypass current flow paths. One bypass current flow path avoids a pumping port 162 in a chamber floor and comprises a conductive symmetrical grill 200 extending from a sidewall up to a grounded pedestal base. Another bypass current flow path avoids a wafer slit valve and comprises an array of conductive straps bridging a sidewall portion occupied by a slit valve 128. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009076870(A) 申请公布日期 2009.04.09
申请号 JP20080192135 申请日期 2008.07.25
申请人 APPLIED MATERIALS INC 发明人 RAUF SHAHID;COLLINS KENNETH S;BERA KALLOL;RAMASWAMY KARTIK;HANAWA KOJI;NGUYEN ANDREW;SHANNON STEVEN C;WONG LAWRENCE;KOBAYASHI SATORU;DETRICK TROY S;CRUSE JAMES P
分类号 H01L21/3065;B01J19/08;H01L21/205;H05H1/46 主分类号 H01L21/3065
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