发明名称 |
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma reactor improving plasma uniformity. <P>SOLUTION: An RF ground return current flow is diverted away from asymmetrical features of a reactor chamber by providing bypass current flow paths. One bypass current flow path avoids a pumping port 162 in a chamber floor and comprises a conductive symmetrical grill 200 extending from a sidewall up to a grounded pedestal base. Another bypass current flow path avoids a wafer slit valve and comprises an array of conductive straps bridging a sidewall portion occupied by a slit valve 128. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009076870(A) |
申请公布日期 |
2009.04.09 |
申请号 |
JP20080192135 |
申请日期 |
2008.07.25 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
RAUF SHAHID;COLLINS KENNETH S;BERA KALLOL;RAMASWAMY KARTIK;HANAWA KOJI;NGUYEN ANDREW;SHANNON STEVEN C;WONG LAWRENCE;KOBAYASHI SATORU;DETRICK TROY S;CRUSE JAMES P |
分类号 |
H01L21/3065;B01J19/08;H01L21/205;H05H1/46 |
主分类号 |
H01L21/3065 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|