| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming an amorphous-carbon hard mask generating no bowing and thinning of a pattern when an amorphous-carbon film is worked in a hard mask shape. SOLUTION: When the amorphous-carbon film 13 is worked, the amorphous-carbon film 13 is worked on its midway of a working (16), and a protective film 12b consisting of an oxide film is formed on the side wall of the exposed amorphous-carbon film. The protective film is formed particularly by sputtering an intermediate mask layer 12a when the amorphous-carbon film is worked. COPYRIGHT: (C)2009,JPO&INPIT |
