METHOD OF MANUFACTURING IMPRINT MOLD

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing an imprint mold suitable for manufacture of an imprint mold having two or more level differences. SOLUTION: In the method of manufacturing an imprint mold, a fresh pattern is patterned again on a patterned photosensitive resin having been used as an etching mask and etching repeatedly. It enables manufacturing an imprint mold having two or more level differences without repeated coating of a photosensitive resin onto a board having level differences by carrying out two or more patterning procedures on a photosensitive resin. It can thus prevent poor structural patterning due to uneven coating of the photosensitive resin and also enables microscopic three-dimensional patterning with high precision. COPYRIGHT: (C)2009,JPO&INPIT