| 摘要 |
<p>An immersion exposure apparatus and device manufacturing method is provided to increase production yield by protecting a mechanical contact with a projection optical system and a substrate stage. A dipping exposure apparatus(100) projects a pattern of a disk on a substrate through the projection optical system and the substrate stage. The projection optical system has an image viewing direction formed in the object into the telecentric system of the circular shape. The projection optical system has the image viewing direction formed in a substrate into the telecentric system of the circular shape. A disk is supported by a disk stage(16), and the position and rotation of the rotation stage is measured by a laser interferometer(14) continuously.</p> |
