发明名称 |
STAGE SYSTEM, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stage system which can suppress the reduction of performance. <P>SOLUTION: The stage system arranged within a chamber includes: a plate member; a movable member that is movable on the upper surface side of the plate member; a supporting section that supports the plate member at three positions; and a stopper device that is provided at the installation section within the chamber opposite to the lower surface of the plate member and includes an opposite section that can touch at least two positions of the lower surface of the plate member. The opposite section in the direction crossing the lower surface varies in position depending on a pressure inside the chamber. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009076583(A) |
申请公布日期 |
2009.04.09 |
申请号 |
JP20070242607 |
申请日期 |
2007.09.19 |
申请人 |
NIKON CORP |
发明人 |
TANAKA KEIICHI;OKUBO YUKIHARU |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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