APPARATUS FOR FORMING PROTECTIVE LAYER

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for forming a carbon protective layer using a plasma CVD method which allows a more uniform in-plane distribution of the carbon protective layer thickness.

SOLUTION: The apparatus 100 for forming a carbon protective layer using a plasma CVD method includes an annular anode 101 that generates a plasma beam and a disk-shaped shield 102 disposed between the anode 101 and a substrate. The anode 101 and the substrate are concentrically arranged so that a straight line connecting the centers of the anode and the substrate is perpendicular to the deposition surface of the substrate where the carbon protective layer is to be formed. The center of the shield 102 is also on the straight line.

COPYRIGHT: (C)2009,JPO&INPIT