| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a polishing pad (polishing layer) excellent in planarization characteristics and exhibiting high polishing speed while suppressing the occurrence of scratch. <P>SOLUTION: The method of manufacturing the polishing pad includes a step of forming a large number of through holes in a resin sheet 11 containing thermoplastic resin and/or thermoplastic elastomer, a step of obtaining a laminated sheet 2 by arranging a metal sheet 13 on one side of the resin sheet, a step of arranging a lump of tin or a tin alloy in a recess of the laminated sheet, a step of forming a conductive area 16 by fixing the lump of tin or a tin alloy in the recess to the resin sheet and the metal sheet, and a step of forming a large number of through holes in the resin sheet at a part other than the conductive area. <P>COPYRIGHT: (C)2009,JPO&INPIT |
