发明名称 FILM-FORMING MATERIAL, CROSSLINKERS AND COATING COMPOSITIONS CONTAINING SILANE, METHODS FOR PRODUCING A COATING COMPOSITION AND A COATED SUBSTRATE
摘要 Film-forming materials include resins and/or crosslinkers having a -Si(OR)3 group. Film-forming resins can include epoxy, acrylic, polyurethane, polycarbonate, polysiloxane, polyvinyl, polyether, aminoplast, and polyester resins. A process to produce a film-forming resin includes reacting various polymers to incorporate a pendent group comprising a -Si(OR)3 group. Crosslinkers for polymerizing a film-forming material include at least two functional groups reactive with a film-forming material and at least one pendent group comprising a -Si(OR)3 group. Functional groups reactive with a film-forming material include isocyanate, blocked isocyanate, uretdione, epoxide, hydroxyl, carboxyl, ester, ether, carbamate, aminoalkanol, aminoalkylether, amide, or amine groups. Film-forming resins and/or crosslinkers having a -Si(OR)3 group can be used in methods of producing coating compositions. Coating compositions can be used to coat a substrate, such as a metal substrate, by electrodeposition. Applied coatings containing the film-forming resins can be cured to form crosslinked films on substrates.
申请公布号 WO2009045558(A2) 申请公布日期 2009.04.09
申请号 WO2008US54198 申请日期 2008.02.18
申请人 BASF CORPORATION;GONZALEZ, SERGIO;DECEMBER, TIMOTHY S. 发明人 GONZALEZ, SERGIO;DECEMBER, TIMOTHY S.
分类号 C09D201/10 主分类号 C09D201/10
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