| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure mask for an aligner capable of approaching to a photoresist film with a light shielding pattern formed on a surface of a substrate to be processed when exposed, closely thereto or under a condition near to a close contact, even when protruded contamination exists on the surface of the substrate to be treated, and to provide a method of manufacturing the same. <P>SOLUTION: The exposure mask 20 for an aligner has the light-transmissive substrate 21, a light shielding film 16a provided on one face of the substrate and having a prescribed pattern, and a recess 24 provided leaving an area provided with the light shielding film, on the one face of the substrate. The recess serves as a storage part for storing the foreign matter deposited on the substrate to be exposed, when exposing the substrate to be exposed, using the exposure mask for the aligner. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
