发明名称 PHOTOELECTRIC CONVERSION DEVICE AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a photoelectric conversion device having improved photoelectric conversion efficiency by increasing open circuit voltage and a short-circuit current without the need for a semiconductor layer as a window layer on a light incident side to contain a high-concentration impurity element, while suppressing the exhaust amount of carbon dioxide, when manufactured. <P>SOLUTION: The photoelectric conversion device comprises at least one p-type semiconductor layer containing silicon atoms, and at least one pin-type photoelectric conversion layer formed by laminating the p-type semiconductor layer, an i-type semiconductor layer and a n-type semiconductor layer, at least one layer of the p-type semiconductor layer containing nitrogen atoms, the p-type semiconductor layer consisting of a first p-type semiconductor layer containing nitrogen atoms at a concentration of 0.5-10 atom%, and a second p-type semiconductor layer having a crystal silicon phase. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009076939(A) 申请公布日期 2009.04.09
申请号 JP20080325973 申请日期 2008.12.22
申请人 SHARP CORP 发明人 NISHIMURA KAZUHITO;NASUNO YOSHIYUKI;YAMAMOTO HIROSHI
分类号 H01L31/04 主分类号 H01L31/04
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