| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position detection device which can detect highly accurately three dimensional position information of, for instance, a mask pattern surface, or an exposure surface of a photosensitive substrate by the simple constitution. <P>SOLUTION: The position detection device 11 comprises a light source 21 for supplying a detection light, a light collecting optical systems 23 for collecting a detection light to a diffracted light generating part PH arranged on a material M, light guiding optical systems 22, 25 for guiding a diffracted measuring light, which is generated at the diffracted light generating part by receiving the detection light, and a reference light, which is generated from a reference surface 24 by receiving the detection light, to a prescribed position, and a photodetector 26 arranged at a prescribed position for detecting interference fringes of the diffracted measuring light and the reference light. <P>COPYRIGHT: (C)2009,JPO&INPIT |
