| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which can eliminate frequency interference among high-frequency signals, as well as easily, accurately, quickly establish impedance matching to each of high-frequency signals among each of electrodes corresponding to high-frequency power supplies for ICP electrode and FS electrode, and can also easily obtain stable ignition of plasma and surely excite plasma discharging. <P>SOLUTION: As the preset condition for automatic matching processing, a variable capacitor CFL1 for loading an FS matching circuit FM1 is fixed at a specified capacity to set a plurality of matching points to one point. Thus, the ratio of an input power ratio to an output power ratio is controlled at 1:1 for an ICP electrode ID1 and an FS electrode FD1. <P>COPYRIGHT: (C)2009,JPO&INPIT |
