ION SOURCE, ION IMPLANTING DEVICE, AND ION IMPLANTATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide an ion source achieving improvement in uniformity of a beam current density distribution in a Y-direction of ribbon-like ion beams and a given uneven distribution, by making partially controllable a plasma density in the Y-direction inside a plasma generating vessel. SOLUTION: The ion source 10b generates ribbon-like ion beams with a dimension in a Y-direction larger than that in an X-direction. The ion source 10b is provided with a plasma generating vessel 12 with an ion extracting port 14 extended in a Y-direction, a plurality of cathodes 20 arranged in a plurality of steps along a Y-direction at one side in an X-direction inside the plasma generating vessel 12, a reflecting electrode 32 set in opposition to the cathodes 20 at the other side in an X-direction inside the plasma generating vessel 12, and electromagnets 40 for generating magnetic fields 50 along the X-direction in a region including the plurality of cathodes 20 inside the plasma generating vessel 12. COPYRIGHT: (C)2009,JPO&INPIT