| 发明名称 |
ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY |
| 摘要 |
The disclosure relates to illumination optical systems for microlithography, such as EUV-microlithography, as well as related systems, components and methods.
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| 申请公布号 |
US2009091731(A1) |
申请公布日期 |
2009.04.09 |
| 申请号 |
US20080233914 |
申请日期 |
2008.09.19 |
| 申请人 |
CARL ZEISS SMT AG |
发明人 |
OSSMANN JENS;ENDRES MARTIN;STUETZLE RALF |
| 分类号 |
G03B27/70;G02B5/09;G03B27/54 |
主分类号 |
G03B27/70 |
| 代理机构 |
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