INSPECTION DEVICE, INSPECTION METHOD, AND MANUFACTURING METHOD OF PATTERN SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a mask inspection device having small power consumption, and a simple structure dispensing with control for synchronizing accurately a two-dimensional imaging device with a laser light source.

SOLUTION: The mask inspection device 1 in one embodiment is equipped with a two-dimensional optical sensor 208 for imaging a defect on a mask 220, and a mode-lock fundamental wave laser 101 for irradiating the mask 220 with light having the larger number of repetition than a line rate of the two-dimensional optical sensor 208. The number of the repetition of light emitted from the fundamental wave laser 101 is 100 times as large as the line rate of the two-dimensional optical sensor 208 or larger.

COPYRIGHT: (C)2009,JPO&INPIT